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    原位构筑双S-Scheme NiO/Fe2O3/g-C3N4异质结协同可见光-Fenton催化降解土霉素

    In situ construction of double S-Scheme NiO/Fe2O3/g-C3N4 heterojunction in collaboration with Photo-Fenton catalytic degradation of oxytetracycline

    • 摘要: 针对g-C3N4对可见光响应效率低和光生电子-空穴分离效率较低的问题,提出将半导体负载到g-C3N4表面的方法,可以提升g-C3N4在光催化降解有机污染物中的应用。文中采用浸渍法合成了三元复合材料NiO/Fe2O3/g-C3N4,对复合材料进行X射线衍射(XRD)、傅里叶变换红外光谱(FT-IR)、荧光光谱(PL)等表征,研究NiO/Fe2O3/g-C3N4复合材料对土霉素(OTC)光催化降解的性能。研究结果表明,在可见光-类Fenton体系中,OTC的降解率达89.1%。在添加空穴捕获剂三乙醇胺后,OTC溶液的降解效率由89.1%下降至42.1%,空穴(h+)、超氧自由基(·O2)和羟基自由基(·OH)是OTC降解过程的主要影响因素。复合材料具有良好的光催化性能是因为Fe2O3与NiO半导体和g-C3N4形成双S-Scheme异质结可以有效地将电子和空穴分离,抑制电子空穴复合。研究结论为异质结催化剂协同光-Fenton在污水处理中的应用提供参考。

       

      Abstract: Aiming at the problems of low response efficiency of g-C3N4 to visible light and low separation efficiency of photogenerated electron-hole, a method of loading semiconductors onto the surface of g-C3N4 is proposed, which can improve the application of g-C3N4 in the photocatalytic degradation of organic pollutants. NiO/Fe2O3/g-C3N4 composites were synthesized by immersion method, and characterized by XRD, FT-IR and PL. The research results show that the degradation rate of OTC can reach 89.1% under photo-Fenton system. After the addition of TEOA, the degradation efficiency of OTC solution decreased from 89.1% to 42.1%. It can be concluded that hole (h+), superoxide radical (·O2) and hydroxyl radical (·OH) were the main factor affecting the degradation process of OTC. NiO/Fe2O3/g-C3N4 photocatalytic composites have good photocatalytic degradation effect on OTC solution because double-S Scheme heterojunction formed between Fe2O3, NiO and g-C3N4 semiconductor can effectively separate electrons and holes and inhibit electron hole recombination. The research conclusion provides a reference for the application of heterojunction catalysts in conjunction with photo-Fenton in wastewater treatment.

       

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